DARPA Microsystems Technology Office is seeking innovative proposals for the development of nano-scale heterogeneous material synthesis on lattice mismatched substrates to realize defect-free, multi-layer heterogenous junctions with atomically sharp surface/interface and atomically abrupt compositional transition.
M-STUDIO will consist of two x 18 month phases:
Phase 1 – defect free sub-10 nm total thickness heterogeneous material synthesis demonstration
Phase 2 – multiple heterogeneous sub-10 nm thick layer material with atomic precision on lattice mismatched substrates realization
M-STUDIO seeks to develop a universal defect-free heterogeneous integration methodology, informed by emerging nano-scale material growth with surface free-energy driven defect termination and non-thermal-equilibrium synthesis, to achieve defect-free multi-layer heterogeneous materials with nanometer dimensions and atomically sharp interfaces. Potential approaches include nanometer scale synthesis with aspect defect trapping and energetic assisted selective material growth.
Proposals are due 6 May 2024.
Document
Broad Agency Announcement – M-STUDIO: HR001124S0019
